投影光刻,Projection lithography
1)Projection lithography投影光刻
1.Soft X-ray projection lithography technology;软X射线投影光刻技术及其发展
2.Design of diffractive optical elements for off-axis illumination in projection lithography;投影光刻离轴照明用衍射光学元件设计
3.Soft X-ray projection lithography is expected as a candidate for VLSI p roduction in the near future.软 X射线投影光刻作为特征线宽小于 0 。
英文短句/例句
1.Two-mirror system design study of reduced projection optics for EUV Lithography;极紫外投影光刻两镜微缩投影系统的光学设计
2.The research results show that IIL can get the high resolution more effectively than conventional optical lithography (OL).研究结果表明，掩模投影成像干涉光刻技术比传统投影光刻能够得到更高的光刻分辨率。
3.Investigation on Extreme Ultraviolet Lithography;极紫外投影光刻中若干关键技术研究
4.Design and Analysis of an Alignment System for the Large-area Scan-and-repeat Projection Lithography大面积循环扫描投影光刻对准系统设计和分析
5.Her eyes flashed to her daughter.她的眼光立刻投向女儿。
6.Thermal Deformation of EUV Mask and its Influence on Lithographic Performance;极紫外光刻掩模热变形及其对光刻性能的影响
7.Schmidt projection optics施密特光学投影系统
8.reduction aligner收缩式投影曝光装置
9.one to one projection system一比一投影曝光装置
10.CRT-photo chromatic film projectio光变色膜显像管投影
11.projection stepper步进式投影曝光装置
12.electron beam projection exposure apparatus电子束投影曝光装置
13.optical orthophotoscope光学正射投影纠正仪
14.optical-mechanical projection system光学－机械投影系统
15.optical dividing head with projection readout光学投影读数分度头
16.optidress projector scope光学修正投影显示器
17.cool beam low volatage electronic projective lamp冷光束低压电子投影灯
18.ozone induced scumming臭氧感生未显影光刻胶形成
相关短句/例句
Stepper[英]["step?][美]["st?p?]投影光刻机
1.The Key Craftwork and Technique of Assembling and Adjusting of Projective Lens ofStepper;投影光刻机镜头的装校关键工艺与技术
3)projection photolithography投影光刻法
4)193 nm projection lithography193nm投影光刻
5)laser projection lithography激光投影光刻
1.Design of foldlaser projection lithography lens;折叠式激光投影光刻物镜的设计研究
2.For thelaser projection lithography system used for the production of large-area,high processing throughput,and cost-effective printed circuit boards(PCB),its illumination system is simulation-designed and optimized using ZEMAX optical design software,and the optimized results are analyzed.针对大面积、高产量和节约型印制电路板(PCB)生产使用的激光投影光刻机,利用ZEMAX工程光学设计软件,对其照明系统进行了模拟设计与优化,并对优化后的结果进行了分析。
6)EUVL极紫外投影光刻
1.To study the two-mirror reduced projection optics for Extreme Ultraviolet Lithography (EUVL), Schwarzschild design form and flat field design form were investigated.极紫外投影光刻(EUVL)两镜微缩投影物镜通常采用Schwarzschild结构和平场结构。
2.Some problems were brought from the short wavelength ofEUVL.针对极紫外投影光刻 ( Extreme Ultraviolet Lithography,简称 EUVL)工作波长短的特点及由此带来的一些问题 ,对 EUVL微缩投影物镜的结构参数进行分析选择 ,设计了离轴照明方式的 Schwarzschild微缩投影成像物镜。
3.A laser-produced plasma(LPP) source with liquid aerosol spray target and nanosecond laser was developed,based on both soft X-ray radiation metrology and extreme ultraviolet projection lithography(EUVL).基于软X射线辐射计量和极紫外投影光刻(EUVL)应用,研制了一台使用纳秒激光器的液体微滴喷射靶激光等离子体(LPP)极紫外光源。
延伸阅读
投影光刻分子式：CAS号：性质：一种把图像投影在光敏材料上的方法。它可免于光学掩模版和光敏材料涂层的接触。
