光刻机,lithography
1)lithography[英][l?"θ?ɡr?fi][美][l?"θɑgr?f?]光刻机
1.Design and Manufacture on Precision Positioning System of Wafer Stage for a Simulated Macro-motion System of Lithography;用于光刻机模拟运动的精密工件台宏动定位系统研制
2.Model Analysis on Inner-world Dynamics for the Simulated Vibration-isolation Testing Equipment of the Stepping and Scanning Lithography;光刻机模拟隔振试验装置内部世界动力学模型分析
3.Synchronization Error Analysis on Step & Scan Lithography;光刻机模拟工件台掩模台同步运动误差分析
英文短句/例句
1.Phase Shift Mask Monitor Scanner Focus;利用相移光刻掩膜版监测光刻机台焦距
2.Focusing and Leveling System for Lithography Tool Based on Machine Vision;基于机器视觉的光刻机调焦调平系统
3.Alignment Mechanism of Nikon Step and Repeat MachineNikon步进重复光刻机的对位机制
4.Research on Precise Mechanism and Related Control Technologies of Euvl Stage;极紫外光刻机工件台精密机械及控制相关技术
5.Hardware design on temperature control system of photoeteching machine光刻机箱体内部温度控制系统的硬件设计
6.photoelectric tracing high precision rule engraving machine光电跟踪高精度刻线机
7.Research on Capability of CD-R and Carve-recording Skill光盘刻录机的性能与刻录技巧的研究
pact disc-recordable光盘刻录机,[港]光盘烧录机
9.CD-RW (compact disc-rewritable)可擦写刻录机,[港]可重写光盘烧录机
10.copying and adding machine拷贝机（用于感光雕刻制板）
11.engraving machine, for photonic machining, for working with highly resistant materials光子加工雕刻机,用于加工高耐蚀材料
12.Research and Manufacture on Control System of Laser Engraving Machine Based on 80C196KC;基于80C196KC的激光雕刻机控制系统研制
13.Study on Application Software of Large Area Laser Engraving System;超大幅面激光雕刻机应用软件的研究
14.Reformation of Computer Room Using PXE Net Ghost Technique to Save CD-ROM Drive应用PXE网刻技术进行机房改造赚光驱
15.laser engraving, laser etching激光雕刻，激光蚀刻
16.Study of Image Processing of Laser Engraving Based on Hollow Optical Fiber;传能光纤激光雕刻机图像处理技术的研究
17.Reserch and Design on the Laser Trim Table Control System of Laser Resistor Trim;激光调阻机光刻平台系统控制研究与设计
18.The Analysis of the Computer Control Laser Glass Engraving Machine and Improvement;计算机控制激光玻璃雕刻机的分析与改进
相关短句/例句
lithographic tool光刻机
1.A novel method for measuring the non-orthogonality of the interferometer system in a step and scanlithographic tool is presented.提出一种精确检测光刻机激光干涉仪测量系统非正交性的新方法。
2.A novel in-situ non-flatness measurement method of wafer chuck in step-and-scan projectionlithographic tool is presented.提出一种步进扫描投影光刻机承片台不平度检测新技术。
3.A novel in-situ non-flatness measurement method of wafer stage mirrors in a step-and scanlithographic tool is presented.提出一种新的步进扫描投影光刻机工件台方镜不平度测量方法。
3)Photolithography equipment光刻机
1.Photolithography equipment, the bottleneck and the most expensive equipment in wafer fabrication, is comprised of serial cluster tools.光刻机是半导体晶圆制造的瓶颈设备,其费用相当昂贵。
2.The world semiconductor equipment market in the year 1999～2000, consist of the equipment investment, the photolithography equipment and the wiring shaping equipment are introduced.介绍了１９９９ ～２０００ 年世界半导体设备市场，包括设备投资、光刻机和布线形成设备。
4)stepper[英]["step?][美]["st?p?]光刻机
1.In this paper,extreme ultraviolet lithography technique is analyzed from the aspects of extreme ultraviolet light source,extreme ultraviolet optical system,reflective mask,resist,stepper,i.本文从极端远紫外光源、极端远紫外光学系统、反射掩模、光刻胶、光刻机等方面对极端远紫外光刻技术进行了分析论述 ,并且对它的应用前景进行了简要分
5)Photolithography[英][,f?ut?li"θ?gr?fi][美][,fotol?"θɑgr?f?]光刻机
1.The Design of Stage for 100nmPhotolithography;100nm步进扫描光刻机硅片台掩模台运动结构设计
6)193 nm lithography equipment193nm光刻机
延伸阅读
负性光刻胶分子式：CAS号：性质：光加工是指以可见紫外光、X射线、电子束、或者离子束作为加工手段的材料处理工艺，具有加工精度高，容易自动化等特点，广泛用于集成电路和印刷电路板制造、印刷制版等领域。光加工用高分子材料指在光作用下材料物性或外形发生变化，以实现对被照材料本身或者被其覆盖材料加工处理的聚合材料。在这类材料中最重要的是在集成电路、激光照排制版和印刷电路制备中使用的光刻胶。根据光与聚合物之间发生的作用机理不同，可以分成光聚合或光交联型光刻胶，也称为负性光刻胶；光分解型光刻胶，也称为正性光刻胶。除了光刻胶之外，光敏涂料，光敏胶等在广义上也属于光加工高分子材料。采用激光引发聚合直接将聚合物零件加工成型的方法也引起工业界的广泛关注，成为结构复杂高分子零部件光加工用高分子材料中的重要成员，其特点是摆脱了模具束缚，可以完全由计算机设计、控制加工。
